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This versatile multi deposition system basically consists of two units, one nanoparticle unit, similar to the Nanosys-1 (built by Oxford Applied Research) and the other part is a CVD unit (built by DCA Instruments). The whole system is maintained under ultra high vacuum with long load-lock and transfer rods to transfer the samples from one chamber to the other. The nanoparticle unit consists of a nanocluster source, a Quadrupole Mass Filter (QMF), a 4-pocket electron-beam evaporator, and a UHV pulsed DC sputter source, descriptions of which are similar to that of Nanosys-1. But the substrate holder has some special features which are not provided in the Nanosys-1. The substrate manipulator has freedom of movement in all three directions. Therefore the charge nanoclusters can be selectively deposited from the incoming cluster beam to avoid the deposition of neutral particles, which will not be affected by the QMF. Thus size-distribution of the nanoparticles will be very uniform. Alongwith the substrate rotation and substrate heating capabilities, substrate biasing is also provided to make the system versatile enough for the fabrication of nanoparticle-based photonic and electronic devices. The CVD unit in Nanosys-2 is a standard unit capable of both thermal CVD and PECVD procedures. This system is basically used for carbon related nanstructures. The Nanoparticle unit and CVD unit are integrated in the same system mainly to keep the samples always under high vacuum, which is very important to fabricate high efficient nano-devices. A magnetically coupled transfer channel and transfer rods are provided in the system to transfer samples from Nanoparticle unit to the CVD chamber under high vacuum. Therefore, nanoparticles deposited in Nanoparticle unit can be transferred to the CVD unit for further treatments to get desired nanostructures under very clean environment, which makes the system silicon IC compatible.