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The work we do is focused on the fabrication, imaging, and characterization of nanoscale devices. Please click on one of the thumbnails on the lab layout below to be directly taken to a description of each piece of equipment.

 

SPI Module Sputter-Coater Surface Profiler: Veeco Dektak 6M Stylus Profilometer Vibration Isolation Table: Smart Table-UT- Newport Corporation Acton Spectrograph-SpectraPro 2500i / Princeton Instruments Milles-Griot 543 Ar-ion Laser JANIS SHI-4 Series 4.2 k Cryostat PSIA XE100 AFM/SPM/STM UNLV Multi-Deposition System with PECVD Unit (NANOSYS-2)

 



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UNLV MULTI-DEPOSITION SYSTEM WITH PECVD UNIT (NANOSYS-2)

This versatile multi deposition system basically consists of two units, one nanoparticle unit, similar to the Nanosys-1 (built by Oxford Applied Research) and the other part is a CVD unit (built by DCA Instruments). The whole system is maintained under ultra high vacuum with long load-lock and transfer rods to transfer the samples from one chamber to the other. The nanoparticle unit consists of a nanocluster source, a Quadrupole Mass Filter (QMF), a 4-pocket electron-beam evaporator, and a UHV pulsed DC sputter source, descriptions of which are similar to that of Nanosys-1. But the substrate holder has some special features which are not provided in the Nanosys-1. The substrate manipulator has freedom of movement in all three directions. Therefore the charge nanoclusters can be selectively deposited from the incoming cluster beam to avoid the deposition of neutral particles, which will not be affected by the QMF. Thus size-distribution of the nanoparticles will be very uniform. Alongwith the substrate rotation and substrate heating capabilities, substrate biasing is also provided to make the system versatile enough for the fabrication of nanoparticle-based photonic and electronic devices. The CVD unit in Nanosys-2 is a standard unit capable of both thermal CVD and PECVD procedures. This system is basically used for carbon related nanstructures. The Nanoparticle unit and CVD unit are integrated in the same system mainly to keep the samples always under high vacuum, which is very important to fabricate high efficient nano-devices. A magnetically coupled transfer channel and transfer rods are provided in the system to transfer samples from Nanoparticle unit to the CVD chamber under high vacuum. Therefore, nanoparticles deposited in Nanoparticle unit can be transferred to the CVD unit for further treatments to get desired nanostructures under very clean environment, which makes the system silicon IC compatible.


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PSIA XE100 AFM/SPM/STM

The XE-100 is a versatile system that is a combined Atomic Force Microscope (AFM), Scanning Probe Microscope (SPM) and Scanning Tunneling Microscope (STM) that provides atomic resolution imaging of nanostructures. This XE-100 AFM/SPM provides the most accurate way to scan the samples with ultimate AFM resolution and reliability via non-contact mode. The system has advanced scan system, on-axis optical viewing with the highest optical resolution (1 micron), flexible sample handling (accommodating samples up to 100 mm in diameter and 20 mm in thickness and weighing up to 500 grams), and true Non-Contact imaging. This AFM can achieve the ultimate resolution of AFM since the sharp end of a tip is preserved in True Non-Contact imaging mode unlike in contact or intermittent (also known as tapping) imaging modes. With motorized focus for on-axis optics, XE-100 provides added versatility to the operation of AFM within the acoustic enclosure. The key feature that enables true Non-Contact Mode is the ultra high force z-scanner that allows a significantly higher resonance frequency than those of conventional piezoelectric tube scanners.


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JANIS SHI-4 Series 4.2 k Cryostat

One of the versatile and effective cryostats is the Janis SHI-4 series for laboratory sample cooling. This system is equipped with interchangeable optics, and includes provisions for a wide variety of electrical connectors. Tapped holes on the vacuum shroud and a sturdy mounting flange provide for convenient mounting in any orientation. The cryostat is optimized for experiments requiring optical access to the sample and can provide continuous sample temperature variation from 4.2K to 325K. Also the optional configurations permit operation to 500 K or 800 K, with special thermometry. The system includes optical vacuum shroud and radiation shield, four o-ring sealed quartz windows, gold-plated OFHC copper sample holder, 10-pin electrical feedthrough, evacuation valve, safety pressure relief valve, silicon diode thermometer and control heater. This cryostat is a valuable tool for elucidating the science of nanostructures.


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Milles-Griot 543 Ar-ion Laser

The Melles-Griot 543 argon-ion lasers are convenient sources of higher power single and fixed multiple wavelength output. The emitted laser has wavelengths ranging from 457 to 514 nm with forced-air cooling. Other features include low noise, custom wavelength selections, wide operating temperature range, and light feedback regulation.


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Acton Spectrograph-SpectraPro 2500i / Princeton Instruments

The Acton SpectraPro 2500i spectrograph is a versatile, high-performance, efficient instrument for optical measurements of a variety of samples including nanostructures. This system provides automated, multi-grating turrets for extended spectral coverage. Four standard focal lengths and a host of unique, customized features make this system ideal for nanomaterials research applications. This spectroscopic system consists of a Princeton Instruments/Acton high resolution CCD (PIXIS) camera, a 0.5 meter spectrometer, sample chamber and white light sources. The system is capable of providing high resolution absorption, emission, photoluminescence and Raman spectra of nanoparticles. The SpectraPro's multi-grating turret makes changing gratings easy. The PIXIS CCD camera equipped with the system provides guaranteed vacuum performance, cooling temperature, and very low dark current for the entire lifetime of the instrument. The camera achieves deep cooling as low as -80°C through multistage thermoelectric cooling using only air. To keep dark current stable, cooling is controlled to within ±0.05°C.


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Vibration Isolation Table: Smart Table-UT- Newport Corporation

The Newport Corp Smart Table with intelligent iQ-damping compensates for the vibration incurred by the ambient environment and provides vibration free measurements on its table surface. The damped work surface, made up of 400 series ferromagnetic stainless steel, eliminates skin resonance. The surface honeycomb cells provide a lighter, stiffer table with better dynamic rigidity. Also the constrained layer core damping attenuates broadband vibration and the triple core interface increases point loading capability.


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Surface Profiler: Veeco Dektak 6M Stylus Profilometer

This Surface Profilometer delivers a unique combination of precise, reliable, simple and easy-to-use measurements. This Dektak 6M Stylus Profilometer provides the flexibility to perform precise step height measurements for thin films down to less than 100 angstroms, as well as thick-film measurements up to several hundred microns thick. The system includes a Low Inertia Sensor 3 (LIS 3), an innovative head that incorporates key technology advances to deliver extremely repeatable measurements with unprecedented sensitivity and vastly increased flexibility. This system has capability of long scans up to 30 mm with extremely stable baseline and upto 60,000 data points per scan. It measures step heights on any surface with programmable stylus force down to 1 mg and Z-height capability to 1 mm. The instrument has vertical resolution in nanometers and horizontal resolution as small as about twenty nanometers.


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SPI Module Sputter-Coater

This fast and efficient instrument uses precious metals (gold/gold-palladium) for the coating of scanning electron microscopy samples. It can be used for metallization of electrical contacts too. The sputtering chamber is evacuated through standard Rotary Vacuum pump upto 10-3 mbar or more. The standard gas feedthrough is provided for the insertion of sputtering gas (Ar) inside the chamber. The system can me used in both sputter mode as well as in etch mode. Standard controller is provided with the system for variable deposition time upto 240 s. By setting the proper deposition time, metal films of as low as few nanometers can be deposited with this system.


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